/ http://www.slideshare.net/images/logo.gif / �ݺ�ߣShare feed for �ݺ�ߣshows by User: Max0911 https://cdn.slidesharecdn.com/profile-photo-Max0911-48x48.jpg?cb=1528446720 Personality: self-directed and motivated ；strong drive for results ；effective team player and cross-functional contributor；excellent communication skills Currently, I work at R&D department as a Principal Engineer in TSMC. I have capability of data/information analysis, problem-solving skill from projects execution and good teamwork spirit through several projects among cross-functional departments. I earned “Best Contribution for developing 28nm BEOL lithographic process” in 2010 and “Best Contribution for developing 16nm FinFET lithographic process” in 2013. In the past few years, mobile or mobile computing brings substantial changes for related industries, especially in s