plasma in ion source and sputtering systems
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This document discusses combining magnetron sputtering plasma and ion source plasma technologies. It shows views of a system that uses both a magnetron sputtering process and ion source, as well as a full view of the combined system and a view of the combined system connected to a power controller rack.
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Reference:
1. D.M. Goebel, I. Katz, Fundamentals of Electric Propulsion, Ion and Hall Thrusters, 2008.
2. M. Ranjan, A. Sharma, A. Vaid, T. Bhatt, V. Nandalan, M.G. James, H. Revathi, S. Mukherjee, AIP
Adv. 6 (2016) 95224
3. R. M. Bradley, J.M.E. Harper, J. Vac. Sci. Technol. A 6 (1988) 2390
4. B. K. Parida, Sooraj K P, S. Hans, V. Pachchigar, S. Augustine, Remyamol T, M. R. Ajith, M. Ranjan;
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