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Recipe for Copper Decapsulation Using RKD Elite Etch



        Acid Type:            Temperature          Volume         Heat-up        Etch time      Rinse time
                               (Celsius):         (ml/min):        time            (sec):         (sec):
                                                                   (sec):
      Mixed 3:1                                                                 Varies with
                                    35属                5             120                              0
     Pulse Mode                                                                 package size
  90% Fuming Nitric
                                                                                See Cookbook
 20% Fuming Sulfuric

Post Etch Rinse:      Spray with Acetone.
                      Post Cleaning varies with device.
                      UltraSonic with Acetone. or D.I. or IPA.
                      NMP seems to attack the wires. ( Again this is device specific. )
                      Dry with N2

Note:                 This works excellent for Cu wire of 2 mil or larger on the Elite Etch.


        Acid Type:            Temperature          Volume         Heat-up        Etch time      Rinse time
                               (Celsius):         (ml/min):        time            (sec):         (sec):
                                                                   (sec):
      Mixed 3:1                                                                 Varies with
                                    25属                5             120                              0
     Pulse Mode                                                                 package size
  90% Fuming Nitric
                                                                                See Cookbook
 20% Fuming Sulfuric

Note: This recipe works with wires  1 mil. ( These recipes only work with the RKD Elite Etch.
( The Nisene systems are unable to achieve the desired results due to pump technologies, mixture control, and
temperature characteristics. )

Ambient room temperature is also a factor.
The ambient room temperature must be at least 3 degrees colder than the etch temperature for this process to
work.

Post Etch Rinse:      Spray with Acetone.
                      Post Cleaning varies with device.
                      UltraSonic with Acetone. or D.I. or IPA.
                      NMP seems to attack the wires. ( Again this is device specific. )

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Recipe For Copper Decapsulation

  • 1. Recipe for Copper Decapsulation Using RKD Elite Etch Acid Type: Temperature Volume Heat-up Etch time Rinse time (Celsius): (ml/min): time (sec): (sec): (sec): Mixed 3:1 Varies with 35属 5 120 0 Pulse Mode package size 90% Fuming Nitric See Cookbook 20% Fuming Sulfuric Post Etch Rinse: Spray with Acetone. Post Cleaning varies with device. UltraSonic with Acetone. or D.I. or IPA. NMP seems to attack the wires. ( Again this is device specific. ) Dry with N2 Note: This works excellent for Cu wire of 2 mil or larger on the Elite Etch. Acid Type: Temperature Volume Heat-up Etch time Rinse time (Celsius): (ml/min): time (sec): (sec): (sec): Mixed 3:1 Varies with 25属 5 120 0 Pulse Mode package size 90% Fuming Nitric See Cookbook 20% Fuming Sulfuric Note: This recipe works with wires 1 mil. ( These recipes only work with the RKD Elite Etch. ( The Nisene systems are unable to achieve the desired results due to pump technologies, mixture control, and temperature characteristics. ) Ambient room temperature is also a factor. The ambient room temperature must be at least 3 degrees colder than the etch temperature for this process to work. Post Etch Rinse: Spray with Acetone. Post Cleaning varies with device. UltraSonic with Acetone. or D.I. or IPA. NMP seems to attack the wires. ( Again this is device specific. )