This document provides an overview of CMOS VLSI design and layout. It discusses the history of integrated circuits from the first transistor to modern multi-billion transistor chips. CMOS gate design using nMOS and pMOS transistors is covered, including pass transistors, latches, flip-flops, and multiplexers. Standard cell layout methodology is introduced along with examples of inverter and NAND gate layouts using stick diagrams. Considerations for wiring tracks and well spacing in layout are also covered.
Introduction to cmos in vlsi to seek for knowledgeRAviTiwaRi537420
油
This document outlines the key concepts covered in the first lecture of an introduction to CMOS VLSI design course, including:
1) The design of basic CMOS logic gates using nMOS pull-down and pMOS pull-up networks along with the concept of conduction complements.
2) The use of pass transistors and transmission gates to implement multiplexers and tristate buffers.
3) The design and operation of basic latches and flip-flops using D latches and a master-slave flip-flop configuration to prevent race conditions between clock signals.
This document provides an overview of the topics that will be covered in the EC6601 VLSI Design course taught by Mrs. R. Chitra at Ramco Institute of Technology in Rajapalayam. The topics include an introduction to integrated circuits and CMOS circuits, MOS transistor theory and processing technology, and how to build a simple CMOS chip. It also outlines the CMOS fabrication process which involves growing oxide layers, patterning polysilicon, and diffusing dopants to form transistors on a silicon wafer through multiple photolithography steps. The document includes diagrams of CMOS inverter structures and transistor operation.
This document discusses CMOS VLSI design and transistor theory. It begins with an introduction to VLSI and the different scales of integration. It then covers MOSFET operation and I-V characteristics in cutoff, linear, and saturation regions. The document discusses capacitance components of MOS transistors including gate, diffusion, overlap, and channel capacitances. It also summarizes non-ideal transistor effects such as mobility degradation, velocity saturation, channel length modulation, and threshold voltage variations.
This document summarizes power in CMOS VLSI circuits. It discusses different sources of power consumption including dynamic power from switching capacitances and static power from leakage currents. Dynamic power is proportional to the activity factor, capacitance, supply voltage, and frequency. Static power comes from subthreshold leakage, gate leakage, junction leakage, and other leakage currents. The document provides examples of estimating power consumption and discusses techniques for reducing both dynamic and static power, such as clock gating, multi-threshold voltage techniques, and power gating.
This document discusses CMOS VLSI digital design. It covers physical principles of CMOS including dopants, nMOS and pMOS transistor operation, and CMOS inverters. It then discusses circuit-level CMOS design including combinational logic, sequential logic, datapaths, and memories. Fabrication steps for building CMOS circuits are outlined including oxidation, photolithography, etching, and diffusion. Circuit performance factors like capacitance, RC delay models, and crosstalk are also covered. Different circuit styles like dynamic logic and pass transistor logic are introduced. Finally, sequencing elements like latches and flip-flops used for sequential logic are discussed.
This document provides an overview of topics that will be covered in the CSCE 613: Fundamentals of VLSI Chip Design course, including:
- Semiconductor theory and how doping creates n-type and p-type materials.
- How MOSFETs work as switches using voltage to control current flow. The basic structures of NMOS, PMOS, and CMOS logic gates.
- Logic gate design and transistor-level implementations of common gates like AND, OR, NAND, NOR.
- IC fabrication process which uses photolithography and multiple masking steps to build transistor layers on a silicon wafer.
- Design rules that define minimum feature sizes to avoid shorts or
This document provides an overview of the CSE460: VLSI Design course. It discusses the history of transistors and integrated circuits. The transistor was invented in 1947 and acted as an electrically controlled switch. The first integrated circuit was developed in 1959, combining multiple transistors on a single chip. Moore's law, proposed in 1965, observed that the number of transistors on a chip doubles every two years. The document outlines different chip types, the chip design and fabrication process, and design methodologies like the top-down and bottom-up approaches.
Very Large Scale Integration (VLSI) is a solid career choice and offers job opportunities for ECE freshers pursuing core employment. In India and overseas, VLSI provides a variety of employment roles featuring outstanding professional growth and salary incentives.
This document provides an overview of CMOS VLSI design. It begins with an introduction to CMOS technology, including the basic structure and operation of NMOS and PMOS transistors. It then discusses DC characteristics such as different operating regions and I-V curves. The document covers fabrication processes like oxidation, photolithography, and etching. It also shows cross-sections and mask views for a sample CMOS inverter, highlighting steps like forming the n-well and adding contacts, polysilicon, diffusion and metal layers.
This document discusses delay modeling and analysis in CMOS VLSI circuits. It defines various delay metrics like propagation delay, rise/fall times, and contamination delay. RC delay models are presented to estimate delay where transistors are modeled as resistors and capacitances. Logical effort and parasitic delay linear models are also introduced for estimating gate delays based on their structure and fanout. Elmore delay calculations and minimizing diffusion capacitance through layout are covered as techniques for analyzing transient response and optimizing speed.
This document discusses non-ideal transistor behavior in CMOS VLSI design. It covers several effects that cause transistors to deviate from ideal behavior, including mobility degradation at high fields, velocity saturation, channel length modulation, threshold voltage variations from the body effect, drain-induced barrier lowering, and short channel effect. It also discusses various sources of leakage current such as subthreshold leakage, gate leakage, and junction leakage. Finally, it covers process and environmental variations and how different "corners" or combinations of variations are used to test circuit performance in non-ideal conditions.
The document discusses CMOS transistor theory, including:
1) It describes the MOS capacitor structure and its operating modes of accumulation, depletion, and inversion.
2) It analyzes the I-V characteristics of nMOS and pMOS transistors in the cutoff, linear, and saturation regions based on the channel charge and carrier velocity.
3) It explains the gate, source, and drain capacitances of MOS transistors and how they impact speed. The gate capacitance contributes to channel charge while other capacitances are parasitic.
This document discusses designing combinational logic circuits using static complementary CMOS design. It explains how to construct static CMOS circuits for logic gates like NAND and NOR by using pull-up and pull-down networks of PMOS and NMOS transistors respectively. Issues related to pass-transistor design like noise margins and static power consumption are also covered. The document provides details on implementing various logic functions using pass-transistor logic and differential pass-transistor logic. It discusses solutions to overcome the disadvantages of pass-transistor logic like level restoration and use of multiple threshold transistors.
The document provides an overview of an ECE5307 course on VLSI design. It discusses integrated circuits and CMOS technology. It covers the VLSI design process including behavioral, structural, and layout representations. Design approaches like full custom and semi-custom styles are compared. Fabrication process steps like oxidation, lithography, and metallization are outlined. Stick diagrams are introduced as a way to represent circuit layout using different colors or lines for layers like polysilicon and diffusion. Key rules for drawing stick diagrams are provided.
VLSI affords IC designers the ability to design utilizing less space. Typically, electronic circuits incorporate a CPU, RAM, ROM, and other peripherals on a single PCBA. However, very large-scale integration (VLSI) technology affords an IC designer the ability to add all of these into one chip.
The document discusses CMOS combination logic design. It covers parameters like speed, power, area and noise margin for combinational logic circuits. It describes static CMOS design and its advantages like full swing output and no steady state power. It discusses transistor level implementation of logic gates like NAND, NOR, XOR and complex Boolean functions. Layout design considerations including stick diagrams, Euler paths and design rules are also covered.
This document provides an introduction to VLSI (Very Large Scale Integration) and key concepts in computer-aided design of integrated circuits. It discusses how the number of transistors on chips has grown exponentially from just two transistors in the first integrated circuit in 1958 to billions of transistors in modern chips. It also summarizes different levels of integration from SSI to VLSI and how CMOS transistors work and have been scaled down in size over time from 10 micrometers to 0.18 micrometers.
The document provides an overview of CMOS design and fabrication. It discusses how VLSI allows many transistors to be integrated on a single chip using CMOS technology. The key aspects covered include:
- The basic operation of MOS transistors and how they function as switches in digital circuits. CMOS uses both NMOS and PMOS transistors for low power consumption.
- Common CMOS gates like inverters and how they are constructed using the pull-up PMOS and pull-down NMOS devices.
- The basic fabrication process which involves growing thin gate oxides, depositing polysilicon gates, and using lithography to pattern the transistors and interconnects layer-by-layer on a silicon wafer
This document provides an overview of VLSI design and MOS transistor principles. It discusses why VLSI design is important due to improvements in integration, power, speed and cost. A brief history of transistor invention and integrated circuit development is given. MOS transistor operation principles including NMOS and PMOS types are explained. CMOS logic gates like inverter, NAND and NOR are described. Electrical properties of CMOS like ideal I-V characteristics are covered.
This document provides an overview of VLSI design. It begins with definitions of integrated circuits, VLSI, MOS and CMOS. It then discusses the evolution of transistors from vacuum tubes to MOSFETs. Key developments included the first transistor in 1947, first integrated circuit in 1958 using bipolar junction transistors, and introduction of MOSFETs and CMOS logic in 1960-1963. The document covers Moore's Law, decreasing feature sizes, logic gates, pass transistors, multiplexers, latches, flip-flops and their implementations in CMOS technology. It provides circuit diagrams and explanations of various digital building blocks used in VLSI systems.
Air pollution is contamination of the indoor or outdoor environment by any ch...dhanashree78
油
Air pollution is contamination of the indoor or outdoor environment by any chemical, physical or biological agent that modifies the natural characteristics of the atmosphere.
Household combustion devices, motor vehicles, industrial facilities and forest fires are common sources of air pollution. Pollutants of major public health concern include particulate matter, carbon monoxide, ozone, nitrogen dioxide and sulfur dioxide. Outdoor and indoor air pollution cause respiratory and other diseases and are important sources of morbidity and mortality.
WHO data show that almost all of the global population (99%) breathe air that exceeds WHO guideline limits and contains high levels of pollutants, with low- and middle-income countries suffering from the highest exposures.
Air quality is closely linked to the earths climate and ecosystems globally. Many of the drivers of air pollution (i.e. combustion of fossil fuels) are also sources of greenhouse gas emissions. Policies to reduce air pollution, therefore, offer a win-win strategy for both climate and health, lowering the burden of disease attributable to air pollution, as well as contributing to the near- and long-term mitigation of climate change.
This document provides an overview of the CSE460: VLSI Design course. It discusses the history of transistors and integrated circuits. The transistor was invented in 1947 and acted as an electrically controlled switch. The first integrated circuit was developed in 1959, combining multiple transistors on a single chip. Moore's law, proposed in 1965, observed that the number of transistors on a chip doubles every two years. The document outlines different chip types, the chip design and fabrication process, and design methodologies like the top-down and bottom-up approaches.
Very Large Scale Integration (VLSI) is a solid career choice and offers job opportunities for ECE freshers pursuing core employment. In India and overseas, VLSI provides a variety of employment roles featuring outstanding professional growth and salary incentives.
This document provides an overview of CMOS VLSI design. It begins with an introduction to CMOS technology, including the basic structure and operation of NMOS and PMOS transistors. It then discusses DC characteristics such as different operating regions and I-V curves. The document covers fabrication processes like oxidation, photolithography, and etching. It also shows cross-sections and mask views for a sample CMOS inverter, highlighting steps like forming the n-well and adding contacts, polysilicon, diffusion and metal layers.
This document discusses delay modeling and analysis in CMOS VLSI circuits. It defines various delay metrics like propagation delay, rise/fall times, and contamination delay. RC delay models are presented to estimate delay where transistors are modeled as resistors and capacitances. Logical effort and parasitic delay linear models are also introduced for estimating gate delays based on their structure and fanout. Elmore delay calculations and minimizing diffusion capacitance through layout are covered as techniques for analyzing transient response and optimizing speed.
This document discusses non-ideal transistor behavior in CMOS VLSI design. It covers several effects that cause transistors to deviate from ideal behavior, including mobility degradation at high fields, velocity saturation, channel length modulation, threshold voltage variations from the body effect, drain-induced barrier lowering, and short channel effect. It also discusses various sources of leakage current such as subthreshold leakage, gate leakage, and junction leakage. Finally, it covers process and environmental variations and how different "corners" or combinations of variations are used to test circuit performance in non-ideal conditions.
The document discusses CMOS transistor theory, including:
1) It describes the MOS capacitor structure and its operating modes of accumulation, depletion, and inversion.
2) It analyzes the I-V characteristics of nMOS and pMOS transistors in the cutoff, linear, and saturation regions based on the channel charge and carrier velocity.
3) It explains the gate, source, and drain capacitances of MOS transistors and how they impact speed. The gate capacitance contributes to channel charge while other capacitances are parasitic.
This document discusses designing combinational logic circuits using static complementary CMOS design. It explains how to construct static CMOS circuits for logic gates like NAND and NOR by using pull-up and pull-down networks of PMOS and NMOS transistors respectively. Issues related to pass-transistor design like noise margins and static power consumption are also covered. The document provides details on implementing various logic functions using pass-transistor logic and differential pass-transistor logic. It discusses solutions to overcome the disadvantages of pass-transistor logic like level restoration and use of multiple threshold transistors.
The document provides an overview of an ECE5307 course on VLSI design. It discusses integrated circuits and CMOS technology. It covers the VLSI design process including behavioral, structural, and layout representations. Design approaches like full custom and semi-custom styles are compared. Fabrication process steps like oxidation, lithography, and metallization are outlined. Stick diagrams are introduced as a way to represent circuit layout using different colors or lines for layers like polysilicon and diffusion. Key rules for drawing stick diagrams are provided.
VLSI affords IC designers the ability to design utilizing less space. Typically, electronic circuits incorporate a CPU, RAM, ROM, and other peripherals on a single PCBA. However, very large-scale integration (VLSI) technology affords an IC designer the ability to add all of these into one chip.
The document discusses CMOS combination logic design. It covers parameters like speed, power, area and noise margin for combinational logic circuits. It describes static CMOS design and its advantages like full swing output and no steady state power. It discusses transistor level implementation of logic gates like NAND, NOR, XOR and complex Boolean functions. Layout design considerations including stick diagrams, Euler paths and design rules are also covered.
This document provides an introduction to VLSI (Very Large Scale Integration) and key concepts in computer-aided design of integrated circuits. It discusses how the number of transistors on chips has grown exponentially from just two transistors in the first integrated circuit in 1958 to billions of transistors in modern chips. It also summarizes different levels of integration from SSI to VLSI and how CMOS transistors work and have been scaled down in size over time from 10 micrometers to 0.18 micrometers.
The document provides an overview of CMOS design and fabrication. It discusses how VLSI allows many transistors to be integrated on a single chip using CMOS technology. The key aspects covered include:
- The basic operation of MOS transistors and how they function as switches in digital circuits. CMOS uses both NMOS and PMOS transistors for low power consumption.
- Common CMOS gates like inverters and how they are constructed using the pull-up PMOS and pull-down NMOS devices.
- The basic fabrication process which involves growing thin gate oxides, depositing polysilicon gates, and using lithography to pattern the transistors and interconnects layer-by-layer on a silicon wafer
This document provides an overview of VLSI design and MOS transistor principles. It discusses why VLSI design is important due to improvements in integration, power, speed and cost. A brief history of transistor invention and integrated circuit development is given. MOS transistor operation principles including NMOS and PMOS types are explained. CMOS logic gates like inverter, NAND and NOR are described. Electrical properties of CMOS like ideal I-V characteristics are covered.
This document provides an overview of VLSI design. It begins with definitions of integrated circuits, VLSI, MOS and CMOS. It then discusses the evolution of transistors from vacuum tubes to MOSFETs. Key developments included the first transistor in 1947, first integrated circuit in 1958 using bipolar junction transistors, and introduction of MOSFETs and CMOS logic in 1960-1963. The document covers Moore's Law, decreasing feature sizes, logic gates, pass transistors, multiplexers, latches, flip-flops and their implementations in CMOS technology. It provides circuit diagrams and explanations of various digital building blocks used in VLSI systems.
Air pollution is contamination of the indoor or outdoor environment by any ch...dhanashree78
油
Air pollution is contamination of the indoor or outdoor environment by any chemical, physical or biological agent that modifies the natural characteristics of the atmosphere.
Household combustion devices, motor vehicles, industrial facilities and forest fires are common sources of air pollution. Pollutants of major public health concern include particulate matter, carbon monoxide, ozone, nitrogen dioxide and sulfur dioxide. Outdoor and indoor air pollution cause respiratory and other diseases and are important sources of morbidity and mortality.
WHO data show that almost all of the global population (99%) breathe air that exceeds WHO guideline limits and contains high levels of pollutants, with low- and middle-income countries suffering from the highest exposures.
Air quality is closely linked to the earths climate and ecosystems globally. Many of the drivers of air pollution (i.e. combustion of fossil fuels) are also sources of greenhouse gas emissions. Policies to reduce air pollution, therefore, offer a win-win strategy for both climate and health, lowering the burden of disease attributable to air pollution, as well as contributing to the near- and long-term mitigation of climate change.
This presentation provides an in-depth analysis of structural quality control in the KRP 401600 section of the Copper Processing Plant-3 (MOF-3) in Uzbekistan. As a Structural QA/QC Inspector, I have identified critical welding defects, alignment issues, bolting problems, and joint fit-up concerns.
Key topics covered:
Common Structural Defects Welding porosity, misalignment, bolting errors, and more.
Root Cause Analysis Understanding why these defects occur.
Corrective & Preventive Actions Effective solutions to improve quality.
Team Responsibilities Roles of supervisors, welders, fitters, and QC inspectors.
Inspection & Quality Control Enhancements Advanced techniques for defect detection.
Applicable Standards: GOST, KMK, SNK Ensuring compliance with international quality benchmarks.
This presentation is a must-watch for:
QA/QC Inspectors, Structural Engineers, Welding Inspectors, and Project Managers in the construction & oil & gas industries.
Professionals looking to improve quality control processes in large-scale industrial projects.
Download & share your thoughts! Let's discuss best practices for enhancing structural integrity in industrial projects.
Categories:
Engineering
Construction
Quality Control
Welding Inspection
Project Management
Tags:
#QAQC #StructuralInspection #WeldingDefects #BoltingIssues #ConstructionQuality #Engineering #GOSTStandards #WeldingInspection #QualityControl #ProjectManagement #MOF3 #CopperProcessing #StructuralEngineering #NDT #OilAndGas
Engineering at Lovely Professional University (LPU).pdfSona
油
LPUs engineering programs provide students with the skills and knowledge to excel in the rapidly evolving tech industry, ensuring a bright and successful future. With world-class infrastructure, top-tier placements, and global exposure, LPU stands as a premier destination for aspiring engineers.
Best KNow Hydrogen Fuel Production in the World The cost in USD kwh for H2Daniel Donatelli
油
The cost in USD/kwh for H2
Daniel Donatelli
Secure Supplies Group
Index
Introduction - Page 3
The Need for Hydrogen Fueling - Page 5
Pure H2 Fueling Technology - Page 7
Blend Gas Fueling: A Transition Strategy - Page 10
Performance Metrics: H2 vs. Fossil Fuels - Page 12
Cost Analysis and Economic Viability - Page 15
Innovations Driving Leadership - Page 18
Laminar Flame Speed Adjustment
Heat Management Systems
The Donatelli Cycle
Non-Carnot Cycle Applications
Case Studies and Real-World Applications - Page 22
Conclusion: Secure Supplies Leadership in Hydrogen Fueling - Page 27
Lecture -3 Cold water supply system.pptxrabiaatif2
油
The presentation on Cold Water Supply explored the fundamental principles of water distribution in buildings. It covered sources of cold water, including municipal supply, wells, and rainwater harvesting. Key components such as storage tanks, pipes, valves, and pumps were discussed for efficient water delivery. Various distribution systems, including direct and indirect supply methods, were analyzed for residential and commercial applications. The presentation emphasized water quality, pressure regulation, and contamination prevention. Common issues like pipe corrosion, leaks, and pressure drops were addressed along with maintenance strategies. Diagrams and case studies illustrated system layouts and best practices for optimal performance.
Preface: The ReGenX Generator innovation operates with a US Patented Frequency Dependent Load Current Delay which delays the creation and storage of created Electromagnetic Field Energy around the exterior of the generator coil. The result is the created and Time Delayed Electromagnetic Field Energy performs any magnitude of Positive Electro-Mechanical Work at infinite efficiency on the generator's Rotating Magnetic Field, increasing its Kinetic Energy and increasing the Kinetic Energy of an EV or ICE Vehicle to any magnitude without requiring any Externally Supplied Input Energy. In Electricity Generation applications the ReGenX Generator innovation now allows all electricity to be generated at infinite efficiency requiring zero Input Energy, zero Input Energy Cost, while producing zero Greenhouse Gas Emissions, zero Air Pollution and zero Nuclear Waste during the Electricity Generation Phase. In Electric Motor operation the ReGen-X Quantum Motor now allows any magnitude of Work to be performed with zero Electric Input Energy.
Demonstration Protocol: The demonstration protocol involves three prototypes;
1. Protytpe #1, demonstrates the ReGenX Generator's Load Current Time Delay when compared to the instantaneous Load Current Sine Wave for a Conventional Generator Coil.
2. In the Conventional Faraday Generator operation the created Electromagnetic Field Energy performs Negative Work at infinite efficiency and it reduces the Kinetic Energy of the system.
3. The Magnitude of the Negative Work / System Kinetic Energy Reduction (in Joules) is equal to the Magnitude of the created Electromagnetic Field Energy (also in Joules).
4. When the Conventional Faraday Generator is placed On-Load, Negative Work is performed and the speed of the system decreases according to Lenz's Law of Induction.
5. In order to maintain the System Speed and the Electric Power magnitude to the Loads, additional Input Power must be supplied to the Prime Mover and additional Mechanical Input Power must be supplied to the Generator's Drive Shaft.
6. For example, if 100 Watts of Electric Power is delivered to the Load by the Faraday Generator, an additional >100 Watts of Mechanical Input Power must be supplied to the Generator's Drive Shaft by the Prime Mover.
7. If 1 MW of Electric Power is delivered to the Load by the Faraday Generator, an additional >1 MW Watts of Mechanical Input Power must be supplied to the Generator's Drive Shaft by the Prime Mover.
8. Generally speaking the ratio is 2 Watts of Mechanical Input Power to every 1 Watt of Electric Output Power generated.
9. The increase in Drive Shaft Mechanical Input Power is provided by the Prime Mover and the Input Energy Source which powers the Prime Mover.
10. In the Heins ReGenX Generator operation the created and Time Delayed Electromagnetic Field Energy performs Positive Work at infinite efficiency and it increases the Kinetic Energy of the system.
Integration of Additive Manufacturing (AM) with IoT : A Smart Manufacturing A...ASHISHDESAI85
油
Combining 3D printing with Internet of Things (IoT) enables the creation of smart, connected, and customizable objects that can monitor, control, and optimize their performance, potentially revolutionizing various industries. oT-enabled 3D printers can use sensors to monitor the quality of prints during the printing process. If any defects or deviations from the desired specifications are detected, the printer can adjust its parameters in real time to ensure that the final product meets the required standards.
2. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 2
Outline
A Brief History
CMOS Gate Design
Pass Transistors
CMOS Latches & Flip-Flops
Standard Cell Layouts
Stick Diagrams
3. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 3
A Brief History
1958: First integrated circuit
Flip-flop using two transistors
Built by Jack Kilby at Texas
Instruments
2010
Intel Core i7 mprocessor
2.3 billion transistors
64 Gb Flash memory
> 16 billion transistors
Courtesy Texas Instruments
[Trinh09]
息 2009 IEEE
4. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 4
Growth Rate
53% compound annual growth rate over 50 years
No other technology has grown so fast so long
Driven by miniaturization of transistors
Smaller is cheaper, faster, lower in power!
Revolutionary effects on society
[Moore65]
Electronics Magazine
5. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 5
Annual Sales
>1019 transistors manufactured in 2008
1 billion for every human on the planet
6. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 6
Invention of the Transistor
Vacuum tubes ruled in first half of 20th century
Large, expensive, power-hungry, unreliable
1947: first point contact transistor
John Bardeen and Walter Brattain at Bell Labs
See Crystal Fire
by Riordan, Hoddeson
AT&T Archives.
Reprinted with
permission.
7. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 7
Transistor Types
Bipolar transistors
npn or pnp silicon structure
Small current into very thin base layer controls
large currents between emitter and collector
Base currents limit integration density
Metal Oxide Semiconductor Field Effect Transistors
nMOS and pMOS MOSFETS
Voltage applied to insulated gate controls current
between source and drain
Low power allows very high integration
8. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 8
1970s processes usually had only nMOS transistors
Inexpensive, but consume power while idle
1980s-present: CMOS processes for low idle power
MOS Integrated Circuits
Intel 1101 256-bit SRAM Intel 4004 4-bit mProc
[Vadasz69]
息 1969 IEEE.
Intel
Museum.
Reprinted
with
permission.
9. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 9
Moores Law: Then
1965: Gordon Moore plotted transistor on each chip
Fit straight line on semilog scale
Transistor counts have doubled every 26 months
Integration Levels
SSI: 10 gates
MSI: 1000 gates
LSI: 10,000 gates
VLSI: > 10k gates
[Moore65]
Electronics Magazine
13. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 13
CMOS Gate Design
Activity:
Sketch a 4-input CMOS NOR gate
A
B
C
D
Y
14. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 14
Complementary CMOS
Complementary CMOS logic gates
nMOS pull-down network
pMOS pull-up network
a.k.a. static CMOS
pMOS
pull-up
network
output
inputs
nMOS
pull-down
network
Pull-up OFF Pull-up ON
Pull-down OFF Z (float) 1
Pull-down ON 0 X (crowbar)
15. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 15
Series and Parallel
nMOS: 1 = ON
pMOS: 0 = ON
Series: both must be ON
Parallel: either can be ON
(a)
a
b
a
b
g1
g2
0
0
a
b
0
1
a
b
1
0
a
b
1
1
OFF OFF OFF ON
(b)
a
b
a
b
g1
g2
0
0
a
b
0
1
a
b
1
0
a
b
1
1
ON OFF OFF OFF
(c)
a
b
a
b
g1 g2 0 0
OFF ON ON ON
(d) ON ON ON OFF
a
b
0
a
b
1
a
b
1
1 0 1
a
b
0 0
a
b
0
a
b
1
a
b
1
1 0 1
a
b
g1 g2
16. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 16
Conduction Complement
Complementary CMOS gates always produce 0 or 1
Ex: NAND gate
Series nMOS: Y=0 when both inputs are 1
Thus Y=1 when either input is 0
Requires parallel pMOS
Rule of Conduction Complements
Pull-up network is complement of pull-down
Parallel -> series, series -> parallel
A
B
Y
17. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 17
Compound Gates
Compound gates can do any inverting function
Ex: (AND-AND-OR-INVERT, AOI22)
Y A B C D
A
B
C
D
A
B
C
D
A B C D
A B
C D
B
D
Y
A
C
A
C
A
B
C
D
B
D
Y
(a)
(c)
(e)
(b)
(d)
(f)
18. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 18
Example: O3AI
Y A B C D
A B
Y
C
D
D
C
B
A
19. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 19
Signal Strength
Strength of signal
How close it approximates ideal voltage source
VDD and GND rails are strongest 1 and 0
nMOS pass strong 0
But degraded or weak 1
pMOS pass strong 1
But degraded or weak 0
Thus nMOS are best for pull-down network
20. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 20
Pass Transistors
Transistors can be used as switches
g = 0
s d
g = 1
s d
0 strong 0
Input Output
1 degraded 1
g = 0
s d
g = 1
s d
0 degraded 0
Input Output
strong 1
g = 1
g = 1
g = 0
g = 0
1
g
s d
g
s d
21. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 21
Transmission Gates
Pass transistors produce degraded outputs
Transmission gates pass both 0 and 1 well
g = 0, gb = 1
a b
g = 1, gb = 0
a b
0 strong 0
Input Output
1 strong 1
g
gb
a b
a b
g
gb
a b
g
gb
a b
g
gb
g = 1, gb = 0
g = 1, gb = 0
22. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 22
Tristates
Tristate buffer produces Z when not enabled
EN A Y
0 0 Z
0 1 Z
1 0 0
1 1 1
A Y
EN
A Y
EN
EN
23. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 23
Nonrestoring Tristate
Transmission gate acts as tristate buffer
Only two transistors
But nonrestoring
Noise on A is passed on to Y
A Y
EN
EN
24. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 24
Tristate Inverter
Tristate inverter produces restored output
Violates conduction complement rule
Because we want a Z output
A
Y
EN
A
Y
EN = 0
Y = 'Z'
Y
EN = 1
Y = A
A
EN
25. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 25
Multiplexers
2:1 multiplexer chooses between two inputs
S D1 D0 Y
0 X 0 0
0 X 1 1
1 0 X 0
1 1 X 1
0
1
S
D0
D1
Y
26. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 26
Gate-Level Mux Design
How many transistors are needed? 20
1 0 (too many transistors)
Y SD SD
4
4
D1
D0
S Y
4
2
2
2 Y
2
D1
D0
S
27. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 27
Transmission Gate Mux
Nonrestoring mux uses two transmission gates
Only 4 transistors
S
S
D0
D1
Y
S
28. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 28
Inverting Mux
Inverting multiplexer
Use compound AOI22
Or pair of tristate inverters
Essentially the same thing
Noninverting multiplexer adds an inverter
S
D0 D1
Y
S
D0
D1
Y
0
1
S
Y
D0
D1
S
S
S
S
S
S
29. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 29
4:1 Multiplexer
4:1 mux chooses one of 4 inputs using two selects
Two levels of 2:1 muxes
Or four tristates
S0
D0
D1
0
1
0
1
0
1
Y
S1
D2
D3
D0
D1
D2
D3
Y
S1S0 S1S0 S1S0 S1S0
30. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 30
D Latch
When CLK = 1, latch is transparent
D flows through to Q like a buffer
When CLK = 0, the latch is opaque
Q holds its old value independent of D
a.k.a. transparent latch or level-sensitive latch
CLK
D Q
Latch
D
CLK
Q
31. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 31
D Latch Design
Multiplexer chooses D or old Q
1
0
D
CLK
Q
CLK
CLK
CLK
CLK
D
Q Q
Q
32. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 32
D Latch Operation
CLK = 1
D Q
Q
CLK = 0
D Q
Q
D
CLK
Q
33. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 33
D Flip-flop
When CLK rises, D is copied to Q
At all other times, Q holds its value
a.k.a. positive edge-triggered flip-flop, master-slave
flip-flop
Flop
CLK
D Q
D
CLK
Q
34. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 34
D Flip-flop Design
Built from master and slave D latches
QM
CLK
CLK
CLK
CLK
Q
CLK
CLK
CLK
CLK
D
Latch
Latch
D Q
QM
CLK
CLK
35. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 35
D Flip-flop Operation
CLK = 1
D
CLK = 0
Q
D
QM
QM
Q
D
CLK
Q
36. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 36
Race Condition
Back-to-back flops can malfunction from clock skew
Second flip-flop fires late
Sees first flip-flop change and captures its result
Called hold-time failure or race condition
CLK1
D
Q1
Flop
Flop
CLK2
Q2
CLK1
CLK2
Q1
Q2
37. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 37
Nonoverlapping Clocks
Nonoverlapping clocks can prevent races
As long as nonoverlap exceeds clock skew
We will use them in this class for safe design
Industry manages skew more carefully instead
1
1
1
1
2
2
2
2
2
1
QM
Q
D
38. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 38
Gate Layout
Layout can be very time consuming
Design gates to fit together nicely
Build a library of standard cells
Standard cell design methodology
VDD and GND should abut (standard height)
Adjacent gates should satisfy design rules
nMOS at bottom and pMOS at top
All gates include well and substrate contacts
40. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 40
Example: NAND3
Horizontal N-diffusion and p-diffusion strips
Vertical polysilicon gates
Metal1 VDD rail at top
Metal1 GND rail at bottom
32 l by 40 l
41. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 41
Stick Diagrams
Stick diagrams help plan layout quickly
Need not be to scale
Draw with color pencils or dry-erase markers
c
A
VDD
GND
Y
A
VDD
GND
B C
Y
INV
metal1
poly
ndiff
pdiff
contact
NAND3
42. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 42
Wiring Tracks
A wiring track is the space required for a wire
4 l width, 4 l spacing from neighbor = 8 l pitch
Transistors also consume one wiring track
43. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 43
Well spacing
Wells must surround transistors by 6 l
Implies 12 l between opposite transistor flavors
Leaves room for one wire track
44. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 44
32 l
40 l
Area Estimation
Estimate area by counting wiring tracks
Multiply by 8 to express in l
45. CMOS VLSI Design 4th Ed.
1: Circuits & Layout 45
Example: O3AI
Sketch a stick diagram for O3AI and estimate area
Y A B C D
A
VDD
GND
B C
Y
D
6 tracks =
48 l
5 tracks =
40 l