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Vapor Phase Deposition Techniques

Introduction
 Vapor Phase Deposition (VPD) technique is a
method of preparing the extremely pure optical
glasses.
 Vapor Phase methods are the ones that are now used
to produce silica-based fibers with very low
attenuation, highest transparency with the optimal
optical properties.
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Ingredients
Starting Materials Dopants
Starting materials are volatile
organic compounds such as:
o SiCl4
o GeCl4
o SiF4
o BCL3
o O2
o BBr3
o POCl3
Refractive index modification is
achieved through the formation
of dopants from the non-silica
starting materials:
o TiO2
o GeO2
o P2O5
o Al2O3
o B2O3
o F
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Classification
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Vapor Phase
Deposition
Flame Hydrolysis
Vapor Axial
Deposition (VAD)
Outside Vapor
Phase Oxidation
Process (OVPO)
Chemical Vapor
Deposition
Modified Chemical
Vapor Deposition
(MCVD)
Plasma-activated
Chemical Vapor
Deposition (PCVD)

Outside Vapor Phase Oxidation (OVPO)
o Uses flame hydrolysis stems from work on soot processes which were
used to produce the first fiber with losses of less than 20 dBKm-1.
o Oxygen is passed through the silicon compound which is vaporized
removing impurities.
o Dopants are added and gave following reactions:
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Outside Vapor Phase Oxidation (OVPO) (cont.)
o The silica is regenerated as a fine soot which is deposited on a cool
rotating mandrel. The flame is reversed back and forth over the length
of the mandrel for getting sufficient numbers of silica layers.
o After the process ends, the mandrel is removed and the porous mass
of silica soot is sintered.
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Vapor Axial Depositions (VAD)
o Continuous technique for
producing low loss optical
fibers.
o Vaporized constituents are
injected from burners and react
to form silica soot by flame
hydrolysis and makes a solid
porous glass preform.
o The preform is pulled upwards.
o Dehydrated by heating with
SOCl2 using the reaction:
Fig: The VAD Process 8

Modified Chemical Vapor Deposition (MCVD)
o Vapor-phase reactants (halide and
oxygen) pass through a hot zone.
o Glass particles formed during this
reaction travel with the gas flow and
are deposited on the walls of the silica
tube.
o The hot zone is moved back and forth
along the tube allowing the particles
to be deposited on a layer-by-layer
basis giving a sintered transparent
silica film on the walls of the tube.
o Vaporized GeCl4 and POCl3 are
added to the gas flow.
o The core glass is then formed by the
deposition of successive layers of
germane-silicate or phosphor-silicate
glass.
o After the deposition is completed the
temperature is increased to between
1700 and 1900 °C. The tube is then
collapsed to give a solid preform
which may then be drawn into fiber.
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Fig: a) Deposition; b) Collapse to
produce a preform; c) Fiber drawing

Plasma-activated Chemical Vapor Deposition (PCVD)
o PCVD is the stimulation
of oxide formation by
means of a non-isothermal
plasma maintained at low
pressure in a microwave
cavity (2.45 GHz) which
surrounds the tube.
o Volatile reactants are
introduced into the tube
where they react
heterogeneously.
o The reaction zone is
moved backwards and
forwards along the tube
by control of the
microwave cavity and a
circularly symmetric layer
growth is formed.
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Fig: The PCVD Process

General Optical Fiber Making Process
Fig: Double Circle Method Fig: Rod-in-tube Method 12

General Optical Fiber Making Process
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Summery
o Both step index and graded index fibers are made with
these processes.
o Gives relatively similar performance for the fabrication of
both multi-mode and single-mode fibers.
o MCVD and VAD technique employed together as MCVD-VAD
hybrid technique for producing polarization
maintaining fiber.
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Vapor Phase Deposition Techniques

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Vapor Phase Deposition Techniques