Photolithography is a process used to produce circuit patterns on a silicon layer. It involves two key steps - photographic masking, where a mask containing the desired pattern is used to project UV light onto the silicon wafer, and photographic etching, where either wet etching using chemicals or dry etching using more UV light is used to remove the exposed areas of the layer based on the pattern. The process allows transferring circuit designs onto silicon wafers using UV light and etching.
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Photolithography
1. Photolithography
By Prof. Hitesh Dholakiya
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2. Photolithography
It is a process to produce circuit/pattern on the Si Layer.
UV light exposure is used.
Two important steps are there in photolithography
1. Photographic Masking : It contains information which we want to project on
Si wafer.
2. Photographic Etching : It contains pattern information which we wants to
remove from layer.
There are two types of photographic etching
Wet Etching (By Chemical)
Dry Etching (By UV light exposure)
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