Personality: self-directed and motivated ；strong drive for results ；effective team player and cross-functional contributor；excellent communication skills
Currently, I work at R&D department as a Principal Engineer in TSMC. I have capability of data/information analysis, problem-solving skill from projects execution and good teamwork spirit through several projects among cross-functional departments. I earned “Best Contribution for developing 28nm BEOL lithographic process” in 2010 and “Best Contribution for developing 16nm FinFET lithographic process” in 2013.
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